SURFACE SPECTROSCOPIC STUDIES OF THE DEPOSITION OF TIN THIN-FILMS FROM TETRAKIS-(DIMETHYLAMIDO)-TITANIUM AND AMMONIA

被引：27

作者：

CORNEILLE, JS ^{[1
]}

CHEN, PJ ^{[1
]}

TRUONG, CM ^{[1
]}

OH, WS ^{[1
]}

GOODMAN, DW ^{[1
]}

机构：

[1] TEXAS A&M UNIV,DEPT CHEM,COLLEGE STN,TX 77843

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579596

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The adsorption and pyrolysis of tetrakis-(dimethylamido)-titanium (TDMAT), Ti[NMe2]4, on several metal substrates, were studied using x-ray photoelectron spectroscopy, Auger electron spectroscopy, infrared reflection absorption spectroscopy and thermal desorption mass spectrometry. TDMAT was found to decompose readily above —480 K on metallic substrates, producing TiCxN7 films exhibiting a carbonrich interface. However, in the presence of NH3, well below the threshold of gas-phase reactions (<10-4 Torr), the growth of low-carboncontent (≤8 at. %) titanium nitride films proceeds readily, via surface mediated reaction(s) of TDMAT and NH3 between 550 and 750 K. The effects of surface temperature and reagent pressures are reported and discussed. © 1995, American Vacuum Society. All rights reserved.

引用

页码：1116 / 1120

页数：5