COMPOSITION PROFILE OF ION-PLATED AU FILM ON CU ANALYZED BY AES AND SIMS DURING XE ION-BOMBARDMENT

被引：23

作者：

NARUSAWA, T ^{[1
]}

KOMIYA, S ^{[1
]}

机构：

[1] ULVAC CORP,CHIGASAKI 253,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 01期

关键词：

D O I：

10.1116/1.1318605

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：312 / 316

页数：5

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