SIMULTANEOUS FORMATION OF SILICIDE OHMIC CONTACTS AND SHALLOW P+-N JUNCTIONS BY ION-BEAM MIXING AND RAPID THERMAL ANNEALING

被引:22
作者
KWONG, DL [1 ]
MEYERS, DC [1 ]
ALVI, NS [1 ]
机构
[1] GM CORP,DELCO ELECTR,KOKOMO,IN 46902
关键词
D O I
10.1109/EDL.1985.26112
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:244 / 246
页数:3
相关论文
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