THE EFFECT OF LOW-TEMPERATURE ANNEALING ON DEFECTS, IMPURITIES, AND ELECTRICAL-PROPERTIES OF (HG,CD)TE

被引:82
作者
SCHAAKE, HF
TREGILGAS, JH
BECK, JD
KINCH, MA
GNADE, BE
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 01期
关键词
D O I
10.1116/1.573186
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
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页码:143 / 149
页数:7
相关论文
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