LITHOGRAPHIC PROPERTIES OF AMORPHOUS WO3 FILMS EXPOSED TO PHOTONS, ELECTRONS, AND HYDROGEN PLASMA

被引：10

作者：

GUPTA, PK ^{[1
]}

CHOPRA, KL ^{[1
]}

机构：

[1] INDIAN INST TECHNOL,DEPT PHYS,THIN FILM & SOLID STATE TECHNOL LAB,NEW DELHI 110016,INDIA

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 10期

关键词：

D O I：

10.1063/1.339101

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4273 / 4276

页数：4

共 21 条

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[7]

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