PLASMA-PROCESSED POSITIVE AND NEGATIVE RESIST BEHAVIOR OF OBLIQUELY DEPOSITED AMORPHOUS P-SE FILMS

被引：6

作者：

GUPTA, PK

KUMAR, A

MALHOTRA, LK

CHOPRA, KL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.582944

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1590 / 1593

页数：4

共 27 条

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