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ELECTRON-BEAM WRITING AND DEVELOPMENT OF INORGANIC CAF2 THIN-FILMS

被引：3
作者：
HARRISON, TR
MANKIEWICH, PM
DAYEM, AH
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期
关键词：
D O I：
10.1116/1.571987
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：718 / 719
页数：2
相关论文
共 3 条
[1]   FORMATION OF AN EPITAXIAL SI INSULATOR SI STRUCTURE BY VACUUM DEPOSITION OF CAF2 AND SI [J].
ASANO, T ;
ISHIWARA, H .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1982, 21 (01) :187-191
[2]   INSITU VAPORIZATION OF VERY LOW-MOLECULAR WEIGHT RESISTS USING 1-2 NM DIAMETER ELECTRON-BEAMS [J].
ISAACSON, M ;
MURRAY, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1117-1120
[3]   ELECTRON-BEAM-INDUCED DECOMPOSITION OF ION BOMBARDED CALCIUM-FLUORIDE SURFACES [J].
STRECKER, CL ;
MODDEMAN, WE ;
GRANT, JT .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6921-6927
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