TITRATION METHOD FOR MEASURING FLUORINE ATOM CONCENTRATION IN MICROWAVE PLASMA-ETCHING

[1] BROWN SC, 1967, BASIC DATA PLASMA PH, P141

[2] IONIZATION CROSS-SECTIONS OF F2 AND CL2 BY ELECTRON-IMPACT [J]. JOURNAL OF CHEMICAL PHYSICS, 1972, 57 (10) : 4104 - &

[3] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403

[4] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136

[5] DEPENDENCE OF F-ATOM DENSITY ON PRESSURE AND FLOW-RATE IN CF4 GLOW-DISCHARGES AS DETERMINED BY EMISSION-SPECTROSCOPY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 353 - 356

[6] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639

[7] Foon R., 1975, PROG REACT KINET MEC, V8, P81

[8] PLASMA ETCHING OF SI AND SIO2 - EFFECT OF OXYGEN ADDITIONS TO CF4 PLASMAS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 3796 - 3803

[9] MOGAB CJ, 1977, J ELECTROCHEM SOC, V124, P1262, DOI 10.1149/1.2133542

[10] HETEROGENEOUS FLUORINE ATOM RECOMBINATION-REACTION ON SEVERAL MATERIALS OF CONSTRUCTION [J]. AIAA JOURNAL, 1976, 14 (05) : 644 - 647

[1] BROWN SC, 1967, BASIC DATA PLASMA PH, P141

[2] IONIZATION CROSS-SECTIONS OF F2 AND CL2 BY ELECTRON-IMPACT [J]. JOURNAL OF CHEMICAL PHYSICS, 1972, 57 (10) : 4104 - &

[3] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403

[4] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136

[5] DEPENDENCE OF F-ATOM DENSITY ON PRESSURE AND FLOW-RATE IN CF4 GLOW-DISCHARGES AS DETERMINED BY EMISSION-SPECTROSCOPY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 353 - 356

[6] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639

[7] Foon R., 1975, PROG REACT KINET MEC, V8, P81

[8] PLASMA ETCHING OF SI AND SIO2 - EFFECT OF OXYGEN ADDITIONS TO CF4 PLASMAS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 3796 - 3803

[9] MOGAB CJ, 1977, J ELECTROCHEM SOC, V124, P1262, DOI 10.1149/1.2133542

[10] HETEROGENEOUS FLUORINE ATOM RECOMBINATION-REACTION ON SEVERAL MATERIALS OF CONSTRUCTION [J]. AIAA JOURNAL, 1976, 14 (05) : 644 - 647