MAGNETORESISTANCE OF AVALANCHING SEMICONDUCTOR DIODES

被引:2
作者
LANYON, HPD [1 ]
机构
[1] WORCESTER POLYTECH INST,ELECT ENGN DEPT,WORCESTER,MA
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1974年 / 21卷 / 01期
关键词
D O I
10.1002/pssa.2210210121
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:197 / 207
页数:11
相关论文
共 21 条
[1]   DISTRIBUTION FUNCTIONS AND IONIZATION RATES FOR HOT ELECTRONS IN SEMICONDUCTORS [J].
BARAFF, GA .
PHYSICAL REVIEW, 1962, 128 (06) :2507-&
[2]   INDIRECT ELECTRON DRIFT VELOCITY VERSUS ELECTRIC FIELD MEASUREMENT IN GAAS [J].
BASTIDA, EM ;
FABRI, G ;
SVELTO, V ;
VAGHI, F .
APPLIED PHYSICS LETTERS, 1971, 18 (01) :28-+
[3]   DRIFT VELOCITY OF ELECTRONS AND HOLES AND ASSOCIATED ANISOTROPIC EFFECTS IN SILICON [J].
CANALI, C ;
OTTAVIANI, G ;
ALBERIGI.A .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1971, 32 (08) :1707-+
[4]  
CHYNOWETH AG, 1968, SEMICONDUCTORS SEMIM, V4
[5]  
Conwell E. M., 1967, SOLID STATE PHYS S9
[6]  
Grove A S, 1967, PHYS TECHNOLOGY SEMI
[7]   THE LOW TEMPERATURE ELECTRICAL CONDUCTIVITY OF NORMAL-TYPE GERMANIUM [J].
KOENIG, SH ;
GUNTHERMOHR, GR .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1957, 2 (04) :268-283
[8]   INTERRELATIONSHIP BETWEEN SATURATED DRIFT VELOCITY AND IMPACT IONIZATION OF ELECTRONS IN SILICON [J].
LANYON, HPD .
APPLIED PHYSICS LETTERS, 1973, 22 (10) :522-524
[9]  
LANYON HPD, 1974, PHYS STATUS SOLIDI A, V21
[10]   IONIZATION RATES OF HOLES + ELECTRONS IN SILICON [J].
LEE, CA ;
KLEIMACK, JJ ;
BATDORF, RL ;
WIEGMANN, W ;
LOGAN, RA .
PHYSICAL REVIEW, 1964, 134 (3A) :A761-+