EXPERIMENTAL CHARACTERIZATION OF TWO-DIMENSIONAL DOPANT PROFILES IN SILICON USING CHEMICAL STAINING

被引：11

作者：

SUBRAHMANYAN, R

MASSOUD, HZ

FAIR, RB

机构：

来源：

关键词：

D O I：

10.1063/1.99559

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2145 / 2147

页数：3

共 9 条

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