PULSED EXCIMER LASER ABLATED BARIUM-TITANATE THIN-FILMS

被引：81

作者：

ROY, D ^{[1
]}

KRUPANIDHI, SB ^{[1
]}

机构：

[1] PENN STATE UNIV,DEPT ENGN SCI & MECH,UNIV PK,PA 16802

来源：

APPLIED PHYSICS LETTERS | 1992年 / 61卷 / 17期

关键词：

D O I：

10.1063/1.108305

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin films of BaTiO3 were deposited on platinum coated silicon substrates by excimer laser (248 nm) ablation at 600-degrees-C or ex situ crystallized at about the same annealing temperature. Films deposited at 600-degrees-C showed good crystallinity and were characterized for ferroelectricity, dielectric constant, dielectric loss, leakage current, and C-V characteristics. The films showed a dielectric constant of 220, a dissipation factor of 0.02, a leakage current of 1.8 X 10(-6) A/cm2 at a bias of 5 V, and a charge storage density of about 40 fC/mum2 at a field of 0.15 MV/cm.

引用

页码：2057 / 2059

页数：3

共 12 条

[1] PULSED LASER DEPOSITION AND FERROELECTRIC CHARACTERIZATION OF BISMUTH TITANATE FILMS [J].