OLEFIN METATHESIS CATALYST .1. ANGLE-RESOLVED AND DEPTH PROFILING XPS STUDY OF TUNGSTEN-OXIDE ON SILICA

被引：21

作者：

VERPOORT, F ^{[1
]}

FIERMANS, L ^{[1
]}

BOSSUYT, AR ^{[1
]}

VERDONCK, L ^{[1
]}

机构：

[1] STATE UNIV GHENT,DEPT SOLID STATE SCI,DIV SURFACE PHYS,B-9000 GHENT,BELGIUM

来源：

JOURNAL OF MOLECULAR CATALYSIS | 1994年 / 90卷 / 1-2期

关键词：

DEPTH PROFILING; SILICA; SURFACE CHARACTERIZATION; TUNGSTEN; XPS;

D O I：

10.1016/0304-5102(93)E0302-W

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Model supports consisting of a thin layer of SiO2 on a silicon single crystal have been used to study the WO3/SiO2/Si (100) catalyst precursor. Compared to the powder analogues, a drastic increase in spectral resolution and detailed band structure is observed in the XPS spectra. Conventional XPS, angle dependent and depth profiling X-ray photoelectron spectroscopy show the presence of two types of tungsten oxide on the surface: microcrystallites of WO3 and a tungsten oxide monolayer chemically bonded to the silica matrix.

引用

页码：43 / 52

页数：10

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