ELECTRONIC-PROPERTIES AND CHEMICAL INTERACTIONS AT III-V COMPOUND SEMICONDUCTOR SURFACES - GERMANIUM AND OXYGEN ON GAAS(110) AND INP(110) CLEAVED SURFACES

被引:31
作者
MONCH, W
机构
来源
APPLICATIONS OF SURFACE SCIENCE | 1985年 / 22-3卷 / MAY期
关键词
D O I
10.1016/0378-5963(85)90204-1
中图分类号
学科分类号
摘要
引用
收藏
页码:705 / 723
页数:19
相关论文
共 53 条
[1]   PHOTOELECTRIC EMISSION AND CONTACT POTENTIALS OF SEMICONDUCTORS [J].
APKER, L ;
TAFT, E ;
DICKEY, J .
PHYSICAL REVIEW, 1948, 74 (10) :1462-1474
[2]   MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY [J].
ARCHER, RJ ;
GOBELI, GW .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1965, 26 (02) :343-&
[3]   TEMPERATURE DEPENDENCE OF WORK FUNCTION OF SILICON [J].
BACHMANN, R .
PHYSIK DER KONDENSITERTEN MATERIE, 1968, 8 (01) :31-+
[4]   CHEMISORPTION OF OXYGEN AT CLEAVED GAAS(110) SURFACES - PHOTON STIMULATION AND CHEMISORPTION STATES [J].
BARTELS, F ;
MONCH, W .
SURFACE SCIENCE, 1984, 143 (2-3) :315-341
[5]   OXYGEN AND HYDROGEN ADSORPTION ON GAAS(110) [J].
BARTELS, F ;
SURKAMP, L ;
CLEMENS, HJ ;
MONCH, W .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (03) :756-762
[6]  
BARTELS F, 1984, VERHANDL DEUT PHYSIK, V9, P170
[7]   GE-GAAS(110) INTERFACE FORMATION [J].
BAUER, RS ;
MCMENAMIN, JC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1444-1449
[8]   INSITU INVESTIGATION OF BAND BENDING DURING FORMATION OF GAAS-GE HETEROSTRUCTURES [J].
BRUGGER, H ;
SCHAFFLER, F ;
ABSTREITER, G .
PHYSICAL REVIEW LETTERS, 1984, 52 (02) :141-144
[10]   PHOTOEMISSION-STUDIES OF THE INITIAL-STAGES OF OXIDATION OF GASB AND INP [J].
CHYE, PW ;
SU, CY ;
LINDAU, I ;
GARNER, CM ;
PIANETTA, P ;
SPICER, WE .
SURFACE SCIENCE, 1979, 88 (2-3) :439-460