ELECTRICAL TRANSPORT IN RF-SPUTTERED SIO2-FILMS - A REVIEW

被引：6

作者：

MEAUDRE, M ^{[1
]}

MEAUDRE, R ^{[1
]}

机构：

[1] UNIV LYON 1, CNRS, DEPT PHYS MAT, F-69622 VILLEURBANNE, FRANCE

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1984年 / 68卷 / 2-3期

关键词：

D O I：

10.1016/0022-3093(84)90012-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

142

引用

页码：281 / 299

页数：19

共 142 条

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