ELECTRICAL TRANSPORT IN RF-SPUTTERED SIO2-FILMS - A REVIEW

被引:6
作者
MEAUDRE, M [1 ]
MEAUDRE, R [1 ]
机构
[1] UNIV LYON 1, CNRS, DEPT PHYS MAT, F-69622 VILLEURBANNE, FRANCE
关键词
D O I
10.1016/0022-3093(84)90012-7
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
142
引用
收藏
页码:281 / 299
页数:19
相关论文
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