CHARACTERIZATION OF ELECTRON-BEAM EXPOSED OPTICAL RESIST

被引：7

作者：

TAM, NN ^{[1
]}

COYNE, RD ^{[1
]}

NEUREUTHER, AR ^{[1
]}

SLAYMAN, CW ^{[1
]}

机构：

[1] HUGHES RES LABS,MALIBU,CA 90265

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.583999

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：361 / 365

页数：5

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