ELECTRONIC CONDUCTION OF TIN OXIDE THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION

被引：45

作者：

KOJIMA, M ^{[1
]}

KATO, H ^{[1
]}

IMAI, A ^{[1
]}

YOSHIDA, A ^{[1
]}

机构：

[1] TOYOHASHI UNIV TECHNOL,TOYOHASHI,AICHI 440,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 04期

关键词：

D O I：

10.1063/1.341741

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1902 / 1905

页数：4

共 11 条

[1] CHEMICAL COMPOSITION AND ELECTRICAL PROPERTIES OF TIN OXIDE-FILMS PREPARED BY VAPOR-DEPOSITION
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[4] TRANSPORT-PROPERTIES OF HIGHLY DOPED POLYCRYSTALLINE AND AMORPHOUS SNO2 FILMS
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[5] PROPERTIES OF CDS FILMS PREPARED BY SPRAY PYROLYSIS
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[7] THE HALL-EFFECT IN POLYCRYSTALLINE AND POWDERED SEMICONDUCTORS
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[8] ELECTRICAL-PROPERTIES OF N-TYPE POLYCRYSTALLINE INDIUM-PHOSPHIDE FILMS
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) : 1065 - 1069
[9] ELECTRICAL PROPERTIES OF POLYCRYSTALLINE SILICON FILMS
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[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (12) : 5247 - 5254
[10] ELECTRICAL AND OPTICAL-PROPERTIES OF UNDOPED AND ANTIMONY-DOPED TIN OXIDE-FILMS
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[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (12) : 6243 - 6251

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