LOW-ABERRATION EINZEL LENS FOR A FOCUSED-ION-BEAM SYSTEM

被引：9

作者：

KURIHARA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1985年 / 24卷 / 02期

关键词：

D O I：

10.1143/JJAP.24.225

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：225 / 230

页数：6

共 13 条

[1] ANAZAWA N, 1983, 10TH P INT C EL ION, P434
[2] ISHITANI T, 1982, J VAC SCI TECHNOL, V16, P80
[3] ELECTRON OPTICAL PROPERTIES OF 3-ELECTRODE ELECTRON LENSES
KANAYA, K
KAWAKATSU, H
YAMAZAKI, H
SIBATA, S
[J]. JOURNAL OF SCIENTIFIC INSTRUMENTS, 1966, 43 (07): : 416 - +
[4] ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE
KOMURO, M
[J]. THIN SOLID FILMS, 1982, 92 (1-2) : 155 - 164
[5] DRY DEVELOPMENT OF RESISTS EXPOSED TO FOCUSED GALLIUM ION-BEAM
KUWANO, H
YOSHIDA, K
YAMAZAKI, SI
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) : L615 - L617
[6] Munro E., 1973, IMAGE PROCESSING COM, P284
[7] FINE-FOCUS ION-BEAMS WITH FIELD-IONIZATION
ORLOFF, J
SWANSON, LW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 845 - 848
[8] ASYMMETRIC ELECTROSTATIC LENS FOR FIELD-EMISSION MICROPROBE APPLICATIONS
ORLOFF, J
SWANSON, LW
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (04) : 2494 - 2501
[9] ELECTROSTATIC EINZEL LENSES WITH REDUCED SPHERICAL-ABERRATION FOR USE IN FIELD-EMISSION GUNS
RIDDLE, GHN
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 857 - 860
[10] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION
SELIGER, RL
KUBENA, RL
OLNEY, RD
WARD, JW
WANG, V
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1610 - 1612