FOCUSED ION-BEAMS IN MICROELECTRONIC FABRICATION

被引：5

作者：

DOHERTY, JA

WARD, BW

KELLOGG, EM

机构：

来源：

IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1983年 / 6卷 / 03期

关键词：

D O I：

10.1109/TCHMT.1983.1136179

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：329 / 333

页数：5

共 12 条

[1]

Broers A, 1965, MICROELECTRON RELIAB, V4, P103

[2]

BROWN WL, 1981, SOLID STATE TECH AUG

[3]

Buck D.A., 1958, DEC 3 5 1958 E JOINT, P55

[4]

CHANG THP, 1975, J VAC SCI TECHNOL, V12

[5]

DOHERTY JA, 1979, SOLID STATE TECH MAY

[6] LIQUID-METAL ALLOY ION SOURCES FOR B, SB, AND SI [J].

GAMO, K ;

UKEGAWA, T ;

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NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1182-1185

[7] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J].

HERRIOTT, DR ;

COLLIER, RJ ;

ALLES, DS ;

STAFFORD, JW .

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[8] LIQUID-METAL SOURCE OF GOLD IONS [J].

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JEFFERIES, DK ;

COCKHILL, TD .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1981, 52 (04) :562-566

[9] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION [J].

SELIGER, RL ;

KUBENA, RL ;

OLNEY, RD ;

WARD, JW ;

WANG, V .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1610-1612

[10] A MASS-SEPARATING FOCUSED-ION-BEAM SYSTEM FOR MASKLESS ION-IMPLANTATION [J].

WANG, V ;

WARD, JW ;

SELIGER, RL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1158-1163

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