INFLUENCE OF THE SPUTTERING GAS-PRESSURE ON DEPOSITION PROFILES

被引：10

作者：

GONZALEZDIAZ, G ^{[1
]}

MARTIL, I ^{[1
]}

SANCHEZQUESADA, F ^{[1
]}

RODRIGUEZVIDAL, M ^{[1
]}

GRASMARTI, A ^{[1
]}

VALLESABARCA, JA ^{[1
]}

机构：

[1] UNIV ALICANTE,FAC CIENCIAS,DEPT FIS,ALICANTE,SPAIN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 03期

关键词：

D O I：

10.1116/1.572028

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1394 / 1397

页数：4

共 21 条

[1]

ABRIL I, UNPUB

[2]

[Anonymous], 1963, KGL DANSKE VIDENSKAB

[3] SELECTIVE THERMALIZATION IN SPUTTERING TO PRODUCE HIGH TC FILMS [J].

CADIEU, FJ ;

CHENCINSKI, N .

IEEE TRANSACTIONS ON MAGNETICS, 1975, MA11 (02) :227-230

[4] STOPPING OF SLOW RECOIL ATOMS IN GASES [J].

FALCONE, G ;

GRASMARTI, A ;

SIGMUND, P ;

SMEND, F ;

AHLERT, J ;

SCHUMACHER, M ;

RULLHUSEN, P ;

ZIEGELER, L .

ZEITSCHRIFT FUR PHYSIK A-HADRONS AND NUCLEI, 1981, 301 (02) :101-107

[5]

GNAEDINGER RJ, 1969, J VAC SCI TECHNOL, V16, P355

[6] SLOWING DOWN AND THERMALIZATION OF SPUTTERED PARTICLE FLUXES - ENERGY-DISTRIBUTIONS [J].

GRASMARTI, A ;

VALLESABARCA, JA .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (02) :1071-1075

[7]

GRASMARTI A, 1982, VIDE COUCHES MINCES, V212, P397

[8] SPUTTERING PROCESS MODEL OF DEPOSITION RATE [J].

KELLER, JH ;

SIMMONS, RG .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) :24-32

[9]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[10] DEPOSITION DEPENDENCE OF RF-SPUTTERED CDS FILMS [J].

MARTIL, I ;

GONZALEZDIAZ, G ;

SANCHEZQUESADA, F ;

RODRIGUEZVIDAL, M .

THIN SOLID FILMS, 1982, 90 (03) :253-257

← 1 2 3 →