OPTICAL-EMISSION CHARACTERIZATION OF A DIVERGENT MAGNETIC-FIELD ELECTRON-CYCLOTRON RESONANCE SOURCE

被引：29

作者：

MCKILLOP, JS

FORSTER, JC

HOLBER, WM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.575819

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：908 / 913

页数：6

相关论文

共 26 条

[1] [Anonymous], 1970, TABLES SPECTRAL LINE
[2] CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453
[3] SELF-ABSORPTION OF SPECTRUM LINES
COWAN, RD
DIEKE, GH
[J]. REVIEWS OF MODERN PHYSICS, 1948, 20 (02) : 418 - 455
[4] OPTICAL DIAGNOSTICS OF LOW-PRESSURE PLASMAS
DREYFUS, RW
JASINSKI, JM
WALKUP, RE
SELWYN, GS
[J]. PURE AND APPLIED CHEMISTRY, 1985, 57 (09) : 1265 - 1276
[5] COMPUTER-SIMULATION OF A CF4 PLASMA-ETCHING SILICON
EDELSON, D
FLAMM, DL
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (05) : 1522 - 1531
[6] ELECTRON-CYCLOTRON HEATING EXPERIMENTS IN TOKAMAKS AND STELLARATORS
ENGLAND, AC
[J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1984, 12 (02) : 124 - 133
[7] PLASMA CHARACTERIZATION FOR A DIVERGENT FIELD ELECTRON-CYCLOTRON RESONANCE SOURCE
FORSTER, J
HOLBER, W
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 899 - 902
[8] CHARACTERISTICS OF MICROWAVE PLASMA AND PREPARATION OF A-SI THIN-FILM
FUJITA, H
HANDA, H
NAGANO, M
MATSUO, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (07): : 1112 - 1116
[9] NEW HIGH INTENSITY ION SOURCE WITH VERY LOW EXTRACTION VOLTAGE
GELLER, R
[J]. APPLIED PHYSICS LETTERS, 1970, 16 (10) : 401 - &
[10] OPTICAL TECHNIQUES IN PLASMA DIAGNOSTICS
GOTTSCHO, RA
MILLER, TA
[J]. PURE AND APPLIED CHEMISTRY, 1984, 56 (02) : 189 - 208