GLASS SURFACE ANALYSIS BY AUGER-ELECTRON SPECTROSCOPY

被引:68
作者
PANTANO, CG [1 ]
DOVE, DB [1 ]
ONODA, GY [1 ]
机构
[1] UNIV FLORIDA,DEPT MAT SCI & ENGN,GAINESVILLE,FL 32611
关键词
D O I
10.1016/0022-3093(75)90068-X
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:41 / 53
页数:13
相关论文
共 23 条
  • [1] CHANG CC, 1974, CHARACTERIZATION SOL
  • [2] AUGER AND ELLIPSOMETRIC STUDY OF PHOSPHORUS SEGREGATION IN OXIDIZED DEGENERATE SILICON
    CHOU, NJ
    VANDERME.YJ
    HAMMER, R
    CAHILL, J
    [J]. APPLIED PHYSICS LETTERS, 1974, 24 (04) : 200 - 202
  • [3] AUGER ANALYSIS OF CHLORINE IN HCL-GROWN, OR CL2-GROWN SIO2 FILMS
    CHOU, NJ
    OSBURN, CM
    VANDERME.YJ
    HAMMER, R
    [J]. APPLIED PHYSICS LETTERS, 1973, 22 (08) : 380 - 381
  • [4] CLARK AE, 1975, THESIS U FLORIDA
  • [5] CLARK AE, 1975, J BIOMED MAT RES APR
  • [6] CLARK AF, TO BE PUBLISHED
  • [7] DETERMINATION OF COMPOSITION OF GLASS SURFACES BY AUGER SPECTROSCOPY
    GOLDSTEIN, B
    CARLSON, DE
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1972, 55 (01) : 51 - +
  • [8] QUANTITATIVE AUGER ANALYSIS USING INTEGRATION TECHNIQUES
    GRANT, JT
    HAAS, TW
    HOUSTON, JE
    [J]. PHYSICS LETTERS A, 1973, A 45 (04) : 309 - 310
  • [9] SOME APPLICATIONS OF AUGER-ELECTRON SPECTROSCOPY TO METALLURGICAL PROBLEMS
    HAAS, TW
    POCKER, DJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (06): : 1087 - 1092
  • [10] OXYGEN OUTGASSING CAUSED BY ELECTRON BOMBARDMENT OF GLASS
    LINEWEAVER, JL
    [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) : 1786 - &