SELF-LIMITING ETCH DEPTHS USING SIMULTANEOUS SPUTTER ETCHING DEPOSITION TECHNIQUE

被引：7

作者：

BERG, S

GELIN, B

OSTLING, M

BABULANAM, SM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 02期

关键词：

D O I：

10.1116/1.572368

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：470 / 473

页数：4

共 13 条

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