BROAD-BEAM ION-SOURCE TECHNOLOGY AND APPLICATIONS

被引：12

作者：

KAUFMAN, HR

ROBINSON, RS

机构：

[1] COMMONWEALTH SCI CORP, ALEXANDRIA, VA 22314 USA

[2] COLORADO STATE UNIV, FT COLLINS, CO 80523 USA

来源：

关键词：

D O I：

10.1016/0042-207X(89)91116-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1175 / 1180

页数：6

共 30 条

[1] Discharge from hot CaO. [J].

Child, CD .

PHYSICAL REVIEW, 1911, 32 (05) :0492-0511

[2]

Cuomo J. J., 1989, HDB ION BEAM PROCESS

[3]

FREISINGER J, 1988, SEP INT C GAS DISCH

[4]

GEIS M, 1989, HDB ION BEAM PROCESS, P219

[5]

Glang LI, 1970, HDB THIN FILM TECHNO, P4

HARPER, JME ;

CUOMO, JJ ;

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :737-756

[7]

HARPER JME, 1984, ION BOMBARDMENT MODI, P127

[8] ION MILLING (ION-BEAM ETCHING), 1975-1978 - BIBLIOGRAPHY [J].

HAWKINS, DT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (04) :1051-1071

[9] ION MILLING (ION-BEAM ETCHING), 1954-1975 - BIBLIOGRAPHY [J].

HAWKINS, DT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1389-1398

[10]

Kaufman H.R., 1974, ADV ELECT ELECT PHYS, V36, P265