ADHESION OF SPUTTER-DEPOSITED CARBIDE FILMS TO STEEL SUBSTRATES

被引：22

作者：

GREENE, JE

PESTES, M

机构：

[1] UNIV ILLINOIS,DEPT MECH & IND ENGN,URBANA,IL 61801

[2] UNIV ILLINOIS,DEPT MET,URBANA,IL 61801

[3] UNIV ILLINOIS,COORD SCI LAB,URBANA,IL 61801

来源：

关键词：

D O I：

10.1016/0040-6090(76)90607-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：373 / 385

页数：13

共 28 条

[1] DISLOCATIONS IN VAPOR-GROWN COMPOSITIONALLY GRADED (IN,GA)P
ABRAHAMS, MS
BUIOCCHI, CJ
OLSEN, GH
[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) : 4259 - 4270
[2] ADHESION OF EVAPORATED METAL FILMS ON GLASS
BENJAMIN, P
WEAVER, C
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1961, 261 (1304) : 516 - +
[3] ADHESION OF METAL FILMS TO GLASS
BENJAMIN, P
WEAVER, C
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1960, 254 (1277): : 177 - &
[4] MEASUREMENT OF ADHESION OF THIN FILMS
BENJAMIN, P
WEAVER, C
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1960, 254 (1277): : 163 - 176
[5] BENJAMIN P, 1963, P R SOC LONDON A, V274, P167
[6] Bowden FP, 2001, FRICTION LUBRICATION
[7] BOWIE MH, 1963, THESIS LEHIGH U
[8] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
BUNSHAH, RF
RAGHURAM, AC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
[9] STYLUS OR SCRATCH METHOD FOR THIN FILM ADHESION MEASUREMENT - SOME OBSERVATIONS AND COMMENTS
BUTLER, DW
STODDART, CT
STUART, PR
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1970, 3 (06) : 877 - &
[10] Campbell D.S., 1969, HDB THIN FILM TECHNO