IRON-NITRIDE THIN-FILMS PREPARED BY ARC-DISCHARGE-TYPE ION-PLATING

被引：19

作者：

UMEDA, K

KAWASHIMO, Y

NAKASONE, M

HARADA, S

TASAKI, A

机构：

[1] SHINKO SEIKI CO LTD,SHIGA 524,JAPAN

[2] MICRO MAGNET CO LTD,TAKASAKI,GUNMA 370,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1984年 / 23卷 / 12期

关键词：

D O I：

10.1143/JJAP.23.1576

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1576 / 1579

页数：4

共 18 条

[1] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS [J].

BUNSHAH, RF ;

RAGHURAM, AC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1385-&

[2] INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS [J].

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2249-&

[3] INTERSTITIAL ATOM CONFIGURATIONS IN STABLE AND METASTABLE FE-N AND FE-C SOLID-SOLUTIONS [J].

DECRISTOFARO, N ;

KAPLOW, R .

METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 1977, 8 (01) :35-44

[4]

Kawashimo Y., 1983, SHINKU, V26, P511

[5] SYNTHESIS OF IRON-NITROGEN COMPOUNDS BY R.F. SPUTTERING - MOSSBAUER STUDIES [J].

LO, C ;

KRISHNASWAMY, SV ;

RAO, KRPM ;

MESSIER, R ;

MULAY, LN .

MATERIALS RESEARCH BULLETIN, 1980, 15 (09) :1267-1272

[6]

MATTOX DM, 1964, J ELECTROCHEM TECH, V2, P294

[7]

MEKATA M, 1972, J PHYS SOC JPN, V33, P63

[8] EFFECT OF ELECTRIC FIELD ON GROWTH OF GOLD THIN FILMS EVAPORATED IN-VACUO [J].

MURAYAMA, Y ;

KASHIWAGI, K ;

MATSUMOTO, M .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1971, 31 (01) :303-+

[9] HIGH RESOLUTION MOSSBAUER SPECTRUM OF FE4N [J].

NOZIK, AJ ;

WOOD, JC ;

HAACKE, G .

SOLID STATE COMMUNICATIONS, 1969, 7 (23) :1677-&

[10] MOSSBAUER STUDY OF ACICULAR IRON-NITRIDE PARTICLES [J].

SAEGUSA, N ;

MORRISH, AH ;

TASAKI, A ;

TAGAWA, K ;

KITA, E .

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1983, 35 (1-3) :123-125

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