SOI BY CVD - EPITAXIAL LATERAL OVERGROWTH (ELO) PROCESS - REVIEW

[1] ALEXANDER EG, 1966, T METALL SOC AIME, V236, P284

[2] CHEMICAL VAPOR-DEPOSITION APPLICATIONS IN MICROELECTRONICS PROCESSING [J]. THIN SOLID FILMS, 1981, 83 (02) : 173 - 186

[3] EPICON CAMERA TUBE - EPITAXIAL DIODE ARRAY VIDICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1971, ED18 (11) : 1036 - +

[4] BRAN PD, 1978, J CRYST GROWTH, V45, P118

[5] LASER CRYSTALLIZATION OF THIN SI FILMS ON AMORPHOUS INSULATING SUBSTRATES [J]. JOURNAL OF CRYSTAL GROWTH, 1983, 63 (03) : 429 - 444

[6] NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .1. SIH4-HCL-H2 SYSTEM AT HIGH-TEMPERATURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) : 194 - 202

[7] THE NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .2. THE SIH2CL2-H2-N2 SYSTEM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : 1836 - 1843

[8] THE NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .3. THE SIH4-HCL-H2 SYSTEM AT LOW-TEMPERATURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (06) : 1353 - 1359

[9] CLAASSEN WAP, 1981, SEMICONDUCTOR SILICO

[10] COHEN C, 1982, ELECTRONICS 0922, P85

[1] ALEXANDER EG, 1966, T METALL SOC AIME, V236, P284

[2] CHEMICAL VAPOR-DEPOSITION APPLICATIONS IN MICROELECTRONICS PROCESSING [J]. THIN SOLID FILMS, 1981, 83 (02) : 173 - 186

[3] EPICON CAMERA TUBE - EPITAXIAL DIODE ARRAY VIDICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1971, ED18 (11) : 1036 - +

[4] BRAN PD, 1978, J CRYST GROWTH, V45, P118

[5] LASER CRYSTALLIZATION OF THIN SI FILMS ON AMORPHOUS INSULATING SUBSTRATES [J]. JOURNAL OF CRYSTAL GROWTH, 1983, 63 (03) : 429 - 444

[6] NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .1. SIH4-HCL-H2 SYSTEM AT HIGH-TEMPERATURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) : 194 - 202

[7] THE NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .2. THE SIH2CL2-H2-N2 SYSTEM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : 1836 - 1843

[8] THE NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .3. THE SIH4-HCL-H2 SYSTEM AT LOW-TEMPERATURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (06) : 1353 - 1359

[9] CLAASSEN WAP, 1981, SEMICONDUCTOR SILICO

[10] COHEN C, 1982, ELECTRONICS 0922, P85