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MEGARAD-RESISTANT 10NM GATE DIELECTRICS
被引:15
作者
:
TERRY, FL
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
TERRY, FL
[
1
]
NAIMAN, ML
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
NAIMAN, ML
[
1
]
AUCOIN, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
AUCOIN, RJ
[
1
]
SENTURIA, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
SENTURIA, SD
[
1
]
机构
:
[1]
MIT,CAMBRIDGE,MA 02139
来源
:
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
|
1981年
/ 28卷
/ 06期
关键词
:
D O I
:
10.1109/TNS.1981.4335735
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:4389 / 4391
页数:3
相关论文
共 12 条
[1]
RADIATION HARDENING OF P-MOS DEVICES BY OPTIMIZATION OF THERMAL S102 GATE INSULATOR
AUBUCHON, KG
论文数:
0
引用数:
0
h-index:
0
AUBUCHON, KG
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1971,
NS18
(06)
: 117
-
+
[2]
AUCOIN RJ, 1981, 160TH M EL SOC DENV
[3]
1 MU-M MOSFET VLSI TECHNOLOGY .2. DEVICE DESIGNS AND CHARACTERISTICS FOR HIGH-PERFORMANCE LOGIC APPLICATIONS
DENNARD, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
DENNARD, RH
GAENSSLEN, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
GAENSSLEN, FH
WALKER, EJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
WALKER, EJ
COOK, PW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
COOK, PW
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
: 325
-
333
[4]
PROCESS OPTIMIZATION OF RADIATION-HARDENED CMOS INTEGRATED-CIRCUITS
DERBENWICK, GF
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
DERBENWICK, GF
GREGORY, BL
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
GREGORY, BL
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
: 2151
-
2156
[5]
DEPENDENCE OF MOS DEVICE RADIATION-SENSITIVITY ON OXIDE IMPURITIES
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
HUGHES, HL
BAXTER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
BAXTER, RD
PHILLIPS, B
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
PHILLIPS, B
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1972,
NS19
(06)
: 256
-
263
[6]
RETARDATION OF DESTRUCTIVE BREAKDOWN OF SIO2-FILMS ANNEALED IN AMMONIA GAS
ITO, T
论文数:
0
引用数:
0
h-index:
0
ITO, T
ARAKAWA, H
论文数:
0
引用数:
0
h-index:
0
ARAKAWA, H
NOZAKI, T
论文数:
0
引用数:
0
h-index:
0
NOZAKI, T
ISHIKAWA, H
论文数:
0
引用数:
0
h-index:
0
ISHIKAWA, H
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(10)
: 2248
-
2251
[7]
Naiman M. L., 1980, International Electron Devices Meeting. Technical Digest, P562
[8]
DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON .2. INFLUENCE OF PROCESSING AND MATERIALS
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
OSBURN, CM
ORMOND, DW
论文数:
0
引用数:
0
h-index:
0
ORMOND, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(05)
: 597
-
+
[9]
SABNIS AG, 1979, IEDM TECH DIG, P18
[10]
SCATTERING OF ELECTRONS BY SURFACE OXIDE CHARGES AND BY LATTICE-VIBRATIONS AT SILICON-SILICON DIOXIDE INTERFACE
SAH, CT
论文数:
0
引用数:
0
h-index:
0
SAH, CT
TSCHOPP, LL
论文数:
0
引用数:
0
h-index:
0
TSCHOPP, LL
NING, TH
论文数:
0
引用数:
0
h-index:
0
NING, TH
[J].
SURFACE SCIENCE,
1972,
32
(03)
: 561
-
&
←
1
2
→
共 12 条
[1]
RADIATION HARDENING OF P-MOS DEVICES BY OPTIMIZATION OF THERMAL S102 GATE INSULATOR
AUBUCHON, KG
论文数:
0
引用数:
0
h-index:
0
AUBUCHON, KG
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1971,
NS18
(06)
: 117
-
+
[2]
AUCOIN RJ, 1981, 160TH M EL SOC DENV
[3]
1 MU-M MOSFET VLSI TECHNOLOGY .2. DEVICE DESIGNS AND CHARACTERISTICS FOR HIGH-PERFORMANCE LOGIC APPLICATIONS
DENNARD, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
DENNARD, RH
GAENSSLEN, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
GAENSSLEN, FH
WALKER, EJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
WALKER, EJ
COOK, PW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
COOK, PW
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
: 325
-
333
[4]
PROCESS OPTIMIZATION OF RADIATION-HARDENED CMOS INTEGRATED-CIRCUITS
DERBENWICK, GF
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
DERBENWICK, GF
GREGORY, BL
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
GREGORY, BL
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
: 2151
-
2156
[5]
DEPENDENCE OF MOS DEVICE RADIATION-SENSITIVITY ON OXIDE IMPURITIES
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
HUGHES, HL
BAXTER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
BAXTER, RD
PHILLIPS, B
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
PHILLIPS, B
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1972,
NS19
(06)
: 256
-
263
[6]
RETARDATION OF DESTRUCTIVE BREAKDOWN OF SIO2-FILMS ANNEALED IN AMMONIA GAS
ITO, T
论文数:
0
引用数:
0
h-index:
0
ITO, T
ARAKAWA, H
论文数:
0
引用数:
0
h-index:
0
ARAKAWA, H
NOZAKI, T
论文数:
0
引用数:
0
h-index:
0
NOZAKI, T
ISHIKAWA, H
论文数:
0
引用数:
0
h-index:
0
ISHIKAWA, H
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(10)
: 2248
-
2251
[7]
Naiman M. L., 1980, International Electron Devices Meeting. Technical Digest, P562
[8]
DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON .2. INFLUENCE OF PROCESSING AND MATERIALS
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
OSBURN, CM
ORMOND, DW
论文数:
0
引用数:
0
h-index:
0
ORMOND, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(05)
: 597
-
+
[9]
SABNIS AG, 1979, IEDM TECH DIG, P18
[10]
SCATTERING OF ELECTRONS BY SURFACE OXIDE CHARGES AND BY LATTICE-VIBRATIONS AT SILICON-SILICON DIOXIDE INTERFACE
SAH, CT
论文数:
0
引用数:
0
h-index:
0
SAH, CT
TSCHOPP, LL
论文数:
0
引用数:
0
h-index:
0
TSCHOPP, LL
NING, TH
论文数:
0
引用数:
0
h-index:
0
NING, TH
[J].
SURFACE SCIENCE,
1972,
32
(03)
: 561
-
&
←
1
2
→