1 MU-M MOSFET VLSI TECHNOLOGY .2. DEVICE DESIGNS AND CHARACTERISTICS FOR HIGH-PERFORMANCE LOGIC APPLICATIONS

被引:41
作者
DENNARD, RH
GAENSSLEN, FH
WALKER, EJ
COOK, PW
机构
[1] IBM Thomas J. Watson Research Center, Yorktown Heights
关键词
D O I
10.1109/T-ED.1979.19431
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Micrometer-dimension n-channel silicon-gate MOSFET's optimized for high-performance logic applications have been designed and characterized for both room-temperature and liquid-nitrogen-tem-perature operation. Appropriate choices of design parameters are shown to give proper device thresholds which are reasonably independent of channel length and width. Depletion-type devices are characterized at room temperature for load device use. Logic performance capability is demonstrated by test results on NOR circuits for representative fanout and loading conditions. Unloaded ring oscillators achieved switching delays down to 240 Ps at room temperature and down to 100 Ps at liquid nitrogen temperature. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.
引用
收藏
页码:325 / 333
页数:9
相关论文
共 12 条
  • [1] ANTONIADIS DA, 1977, 50191 STANF EL LAB T
  • [2] DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS
    DENNARD, RH
    GAENSSLEN, FH
    YU, HN
    RIDEOUT, VL
    BASSOUS, E
    LEBLANC, AR
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) : 256 - 268
  • [3] ELECTRON-BEAM FABRICATION OF ION-IMPLANTED HIGH-PERFORMANCE FET CIRCUITS
    FANG, F
    HATZAKIS, M
    TING, CH
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1082 - 1085
  • [4] HOT ELECTRON EFFECTS AND SATURATION VELOCITIES IN SILICON INVERSION LAYERS
    FANG, FF
    FOWLER, AB
    [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (04) : 1825 - +
  • [5] FANG FF, 1970, NOV IEEE INT EL DEV
  • [6] VERY SMALL MOSFETS FOR LOW-TEMPERATURE OPERATION
    GAENSSLEN, FH
    RIDEOUT, VL
    WALKER, EJ
    WALKER, JJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1977, 24 (03) : 218 - 229
  • [7] TEMPERATURE-DEPENDENT THRESHOLD BEHAVIOR OF DEPLETION MODE MOSFETS
    GAENSSLEN, FH
    JAEGER, RC
    [J]. SOLID-STATE ELECTRONICS, 1979, 22 (04) : 423 - 430
  • [8] GAENSSLEN FH, 1977, IEDM, P520
  • [9] FUNDAMENTAL LIMITATIONS IN MICROELECTRONICS .1. MOS TECHNOLOGY
    HOENEISEN, B
    MEAD, CA
    [J]. SOLID-STATE ELECTRONICS, 1972, 15 (07) : 819 - +
  • [10] THRESHOLD VOLTAGE OF NARROW CHANNEL FIELD-EFFECT TRANSISTORS
    KROELL, KE
    ACKERMAN, GK
    [J]. SOLID-STATE ELECTRONICS, 1976, 19 (01) : 77 - 81