RANGE PROFILES OF MEDIUM AND HEAVY-IONS IMPLANTED INTO SIO2

被引:26
作者
GRANDE, PL
FICHTNER, PFP
BEHAR, M
ZAWISLAK, FC
机构
关键词
D O I
10.1016/0168-583X(88)90093-6
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
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页码:17 / 20
页数:4
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