THE USE OF REFRACTORY-METAL AND ELECTRON-BEAM SINTERING TO REDUCE CONTACT RESISTANCE FOR VLSI

被引：8

作者：

CHEN, JYT

RENSCH, DB

机构：

来源：

关键词：

D O I：

10.1109/T-ED.1983.21335

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1542 / 1550

页数：9

共 19 条

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[3]

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[5]

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[6]

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[7]

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[8]

HU C, 1979, IEDM, P2329

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