QUICK DEPOSITION OF ZNS-MN ELECTROLUMINESCENT THIN-FILMS BY INTENSE, PULSED, ION-BEAM EVAPORATION

被引：31

作者：

SHIMOTORI, Y

YOKOYAMA, M

HARADA, S

MASUGATA, K

YATSUI, K

机构：

[1] NIPPON SEIKI CO LTD,NAGAOKA,NIIGATA 940,JAPAN

[2] NAGAOKA UNIV TECHNOL,DEPT ELECT ENGN,NAGAOKA,NIIGATA 94021,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 03期

关键词：

D O I：

10.1143/JJAP.28.468

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：468 / 472

页数：5

共 16 条

[1]

ANDERSEN HH, 1977, HYDROGEN STOPPING PO, P80

[2]

EVANS RD, 1955, ATOMIC NUCLEUS, pCH18

[3] DYNAMICS OF LASER-INDUCED VAPORIZATION FOR ULTRAFAST DEPOSITION OF AMORPHOUS-SILICON FILMS [J].

HANABUSA, M ;

SUZUKI, M ;

NISHIGAKI, S .

APPLIED PHYSICS LETTERS, 1981, 38 (05) :385-387

[4]

INOGUCHI T, 1987, KEIKOTAI HDB

[5]

NELKOWSKI H, 1982, LANDOLTBORNSTEIN NUM, V17

[6]

Sasakura H., 1982, Oyo Buturi, V51, P821

[7] PREPARATION OF AMORPHOUS TIO2 FILMS BY THERMOPHORESIS-AIDED CHEMICAL VAPOR-DEPOSITION [J].

SHIMOGAKI, Y ;

KOMIYAMA, H .

CHEMISTRY LETTERS, 1986, (03) :267-268

[8]

Shimotori Y., 1988, Oyo Buturi, V57, P1078

[9] PREPARATION AND CHARACTERISTICS OF ZNS THIN-FILMS BY INTENSE PULSED ION-BEAM [J].

SHIMOTORI, Y ;

YOKOYAMA, M ;

ISOBE, H ;

HARADA, S ;

MASUGATA, K ;

YATSUI, K .

JOURNAL OF APPLIED PHYSICS, 1988, 63 (03) :968-970

[10]

SHIMOTORI Y, 1988, B NAGAOKA U TECH, V10, P57

← 1 2 →