EFFECT OF INERT ION-BOMBARDMENT ON CHEMISORPTION AND ETCHING OF ALUMINUM FILMS IN CL-2, BR-2, CCL4, AND CBR4

被引：22

作者：

PARK, S

RATHBUN, LC

RHODIN, TN

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.573310

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：791 / 794

页数：4

共 17 条

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