A TWIN-WELL CMOS PROCESS EMPLOYING HIGH-ENERGY ION-IMPLANTATION

被引：25

作者：

STOLMEIJER, A ^{[1
]}

机构：

[1] TWENTE UNIV TECHNOL,DEPT ELECT ENGN,7500 AE ENSCHEDE,NETHERLANDS

来源：

关键词：

D O I：

10.1109/T-ED.1986.22511

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：450 / 457

页数：8

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