KRF FAST DISCHARGE LASER IN MIXTURES CONTAINING NF3, N2F4 OR SF6

被引：38

作者：

ANDREWS, AJ

KEARSLEY, AJ

WEBB, CE

HAYDON, SC

机构：

[1] UNIV OXFORD,CLARENDON LAB,DEPT PHYS,OXFORD,ENGLAND

[2] UNIV NEW ENGLAND,DEPT PHYS,ARMIDALE 2351,NEW S WALES,AUSTRALIA

来源：

OPTICS COMMUNICATIONS | 1977年 / 20卷 / 02期

关键词：

D O I：

10.1016/0030-4018(77)90348-0

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

收藏

页码：265 / 268

页数：4

相关论文

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[7] ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER
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[9] 100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM
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[10] WANG CP, 1976, APPL PHYS LETT, V29, P103, DOI 10.1063/1.88985