EXCIMER-LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON

被引：36

作者：

YAMADA, A

KONAGAI, M

TAKAHASHI, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1985年 / 24卷 / 12期

关键词：

D O I：

10.1143/JJAP.24.1586

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1586 / 1589

页数：4

共 11 条

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