THE VARIATION OF PHYSICAL-PROPERTIES OF PLASMA-DEPOSITED SILICON-NITRIDE AND OXYNITRIDE WITH THEIR COMPOSITIONS

被引：63

作者：

NGUYEN, VS

BURTON, S

PAN, P

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 10期

关键词：

D O I：

10.1149/1.2115255

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2348 / 2358

页数：11

共 24 条

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