EFFECT OF DIFFUSE-SCATTERING IN THE STRAIN PROFILE DETERMINATION BY DOUBLE CRYSTAL X-RAY-DIFFRACTION

被引：22

作者：

CEMBALI, F

SERVIDORI, M

GABILLI, E

LOTTI, R

机构：

[1] CNR, Istituto LAMEL, Bologna, Italy, CNR, Istituto LAMEL, Bologna, Italy

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1985年 / 87卷 / 01期

关键词：

DOUBLE CRYSTAL X-RAY DIFFRACTION - ION IMPLANTATION;

D O I：

10.1002/pssa.2210870123

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：225 / 233

页数：9

共 22 条

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[8] ASYMMETRIC X-RAY BRAGG REFLECTION AND SHALLOW STRAIN DISTRIBUTION IN SILICON SINGLE-CRYSTALS [J].

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