MODELING OF LOW-PRESSURE CVD PROCESSES

[1] MODELING OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (05) : 501 - 504

[2] CLAASSEN WAP, J CRYST GROWTH

[3] O'Malley R.E., 1974, INTRO SINGULAR PERTU

[4] LOW-PRESSURE DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE [J]. JOURNAL OF CRYSTAL GROWTH, 1981, 54 (02) : 310 - 322

[1] MODELING OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (05) : 501 - 504

[2] CLAASSEN WAP, J CRYST GROWTH

[3] O'Malley R.E., 1974, INTRO SINGULAR PERTU

[4] LOW-PRESSURE DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE [J]. JOURNAL OF CRYSTAL GROWTH, 1981, 54 (02) : 310 - 322