PROCESSES OF THE ACTIVATED REACTIVE EVAPORATION TYPE AND THEIR TRIBOLOGICAL APPLICATIONS

[31] KODAMA M, 1978, THIN SOLID FILMS, V54, P353, DOI 10.1016/0040-6090(78)90397-8

[32] INTERRUPTED CUTTING TESTS OF CEMENTED CARBIDE TOOLS COATED BY PHYSICAL VAPOR-DEPOSITION AND CHEMICAL VAPOR-DEPOSITION TECHNIQUES [J]. THIN SOLID FILMS, 1982, 96 (01) : 53 - 58

[33] FORMATION OF THICK TITANIUM CARBIDE FILMS BY HOLLOW-CATHODE DISCHARGE REACTIVE DEPOSITION PROCESS [J]. THIN SOLID FILMS, 1978, 54 (01) : 51 - 60

[34] KOSICKI BB, 1969, J VAC SCI TECHNOL, V6, P592

[35] ACTIVATED REACTIVE EVAPORATION OF TIO2 LAYERS AND THEIR ABSORPTION INDEXES [J]. THIN SOLID FILMS, 1980, 70 (01) : 43 - 47

[36] Chemical reactions at very low pressures. II. The chemical clean-up of nitrogen in a tungsten lamp. [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1913, 35 : 931 - 945

[37] LOW-TEMPERATURE EPITAXY OF BETA-SIC BY REACTIVE DEPOSITION [J]. APPLIED PHYSICS LETTERS, 1970, 17 (01) : 26 - &

[38] CHARACTERISTICS OF A THERMIONICALLY ASSISTED TRIODE ION-PLATING SYSTEM [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 41 - 48

[39] MOVCHAN BA, 1969, PHYS METALS METALLOG, V28, P83

[40] HIGH-TEMPERATURE CREEP STUDY OF FE-CU AND NI-CU MULTILAYER CONDENSATES [J]. THIN SOLID FILMS, 1981, 83 (01) : 21 - 26

[31] KODAMA M, 1978, THIN SOLID FILMS, V54, P353, DOI 10.1016/0040-6090(78)90397-8

[32] INTERRUPTED CUTTING TESTS OF CEMENTED CARBIDE TOOLS COATED BY PHYSICAL VAPOR-DEPOSITION AND CHEMICAL VAPOR-DEPOSITION TECHNIQUES [J]. THIN SOLID FILMS, 1982, 96 (01) : 53 - 58

[33] FORMATION OF THICK TITANIUM CARBIDE FILMS BY HOLLOW-CATHODE DISCHARGE REACTIVE DEPOSITION PROCESS [J]. THIN SOLID FILMS, 1978, 54 (01) : 51 - 60

[34] KOSICKI BB, 1969, J VAC SCI TECHNOL, V6, P592

[35] ACTIVATED REACTIVE EVAPORATION OF TIO2 LAYERS AND THEIR ABSORPTION INDEXES [J]. THIN SOLID FILMS, 1980, 70 (01) : 43 - 47

[36] Chemical reactions at very low pressures. II. The chemical clean-up of nitrogen in a tungsten lamp. [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1913, 35 : 931 - 945

[37] LOW-TEMPERATURE EPITAXY OF BETA-SIC BY REACTIVE DEPOSITION [J]. APPLIED PHYSICS LETTERS, 1970, 17 (01) : 26 - &

[38] CHARACTERISTICS OF A THERMIONICALLY ASSISTED TRIODE ION-PLATING SYSTEM [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 41 - 48

[39] MOVCHAN BA, 1969, PHYS METALS METALLOG, V28, P83

[40] HIGH-TEMPERATURE CREEP STUDY OF FE-CU AND NI-CU MULTILAYER CONDENSATES [J]. THIN SOLID FILMS, 1981, 83 (01) : 21 - 26