HYDROGEN-RELATED MECHANICAL-STRESS IN AMORPHOUS-SILICON AND PLASMA-DEPOSITED SILICON-NITRIDE

被引：54

作者：

PADUSCHEK, P ^{[1
]}

HOPFL, C ^{[1
]}

MITLEHNER, H ^{[1
]}

机构：

[1] SIEMENS AG,ZENT FORSCHUNGSLAB,D-8000 MUNICH 83,FED REP GER

来源：

THIN SOLID FILMS | 1983年 / 110卷 / 04期

关键词：

D O I：

10.1016/0040-6090(83)90510-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：291 / 304

页数：14

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