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SOLID-PHASE REACTIONS OF A POLYCRYSTALLINE SILICON FILM WITH AN OVERLAPPING ALUMINUM FILM
被引:8
作者
:
FUKUDA, Y
论文数:
0
引用数:
0
h-index:
0
FUKUDA, Y
KOHDA, S
论文数:
0
引用数:
0
h-index:
0
KOHDA, S
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1983年
/ 42卷
/ 01期
关键词
:
D O I
:
10.1063/1.93728
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:68 / 70
页数:3
相关论文
共 6 条
[1]
SOLID-PHASE CRYSTALLIZATION OF SI FILMS IN CONTACT WITH AI LAYERS
HARRIS, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
HARRIS, JM
BLATTNER, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
BLATTNER, RJ
WARD, ID
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
WARD, ID
EVANS, CA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
EVANS, CA
FRASER, HL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
FRASER, HL
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
NICOLET, MA
RAMILLER, CL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
RAMILLER, CL
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(07)
: 2897
-
2904
[2]
METHODS FOR MINIMIZING SILICON REGROWTH IN ALUMINUM FILMS
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
LEARN, AJ
NOWICKI, RS
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
NOWICKI, RS
[J].
APPLIED PHYSICS LETTERS,
1979,
35
(08)
: 611
-
614
[3]
INTERACTION OF AL LAYERS WITH POLYCRYSTALLINE SI
NAKAMURA, K
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
NAKAMURA, K
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
NICOLET, MA
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
MAYER, JW
BLATTNER, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
BLATTNER, RJ
EVANS, CA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
EVANS, CA
[J].
JOURNAL OF APPLIED PHYSICS,
1975,
46
(11)
: 4678
-
4684
[4]
STUDIES OF SILICON REGROWTH WITH ALUMINUM AND ALUMINUM-ALLOY METALLIZATIONS
NOWICKI, RS
论文数:
0
引用数:
0
h-index:
0
机构:
INTEL CORP,SANTA CLARA,CA 95051
INTEL CORP,SANTA CLARA,CA 95051
NOWICKI, RS
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
INTEL CORP,SANTA CLARA,CA 95051
INTEL CORP,SANTA CLARA,CA 95051
LEARN, AJ
[J].
THIN SOLID FILMS,
1980,
67
(02)
: 385
-
393
[5]
DIFFUSION-LIMITED SI PRECIPITATION IN EVAPORATED AL/SI FILMS
VANGURP, GJ
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
VANGURP, GJ
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(05)
: 2040
-
2050
[6]
GRAIN-GROWTH MECHANISM OF HEAVILY PHOSPHORUS-IMPLANTED POLYCRYSTALLINE SILICON
WADA, Y
论文数:
0
引用数:
0
h-index:
0
WADA, Y
NISHIMATSU, S
论文数:
0
引用数:
0
h-index:
0
NISHIMATSU, S
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(09)
: 1499
-
1504
←
1
→
共 6 条
[1]
SOLID-PHASE CRYSTALLIZATION OF SI FILMS IN CONTACT WITH AI LAYERS
HARRIS, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
HARRIS, JM
BLATTNER, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
BLATTNER, RJ
WARD, ID
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
WARD, ID
EVANS, CA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
EVANS, CA
FRASER, HL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
FRASER, HL
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
NICOLET, MA
RAMILLER, CL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
RAMILLER, CL
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(07)
: 2897
-
2904
[2]
METHODS FOR MINIMIZING SILICON REGROWTH IN ALUMINUM FILMS
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
LEARN, AJ
NOWICKI, RS
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
NOWICKI, RS
[J].
APPLIED PHYSICS LETTERS,
1979,
35
(08)
: 611
-
614
[3]
INTERACTION OF AL LAYERS WITH POLYCRYSTALLINE SI
NAKAMURA, K
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
NAKAMURA, K
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
NICOLET, MA
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
MAYER, JW
BLATTNER, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
BLATTNER, RJ
EVANS, CA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
EVANS, CA
[J].
JOURNAL OF APPLIED PHYSICS,
1975,
46
(11)
: 4678
-
4684
[4]
STUDIES OF SILICON REGROWTH WITH ALUMINUM AND ALUMINUM-ALLOY METALLIZATIONS
NOWICKI, RS
论文数:
0
引用数:
0
h-index:
0
机构:
INTEL CORP,SANTA CLARA,CA 95051
INTEL CORP,SANTA CLARA,CA 95051
NOWICKI, RS
LEARN, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
INTEL CORP,SANTA CLARA,CA 95051
INTEL CORP,SANTA CLARA,CA 95051
LEARN, AJ
[J].
THIN SOLID FILMS,
1980,
67
(02)
: 385
-
393
[5]
DIFFUSION-LIMITED SI PRECIPITATION IN EVAPORATED AL/SI FILMS
VANGURP, GJ
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
VANGURP, GJ
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(05)
: 2040
-
2050
[6]
GRAIN-GROWTH MECHANISM OF HEAVILY PHOSPHORUS-IMPLANTED POLYCRYSTALLINE SILICON
WADA, Y
论文数:
0
引用数:
0
h-index:
0
WADA, Y
NISHIMATSU, S
论文数:
0
引用数:
0
h-index:
0
NISHIMATSU, S
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(09)
: 1499
-
1504
←
1
→