GROWTH OF HEXAGONAL PLATE CRYSTAL IN VACUUM-DEPOSITED AMORPHOUS FILMS OF ANTIMONY

被引：7

作者：

MAKI, K ^{[1
]}

OOKAWA, A ^{[1
]}

机构：

[1] GAKUSHUIN UNIV,DEPT PHYS,TOKYO 171,JAPAN

来源：

JOURNAL OF CRYSTAL GROWTH | 1986年 / 79卷 / 1-3期

关键词：

D O I：

10.1016/0022-0248(86)90429-X

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：144 / 148

页数：5

共 9 条

[1]

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[2] CRYSTALLIZATION IN AMORPHOUS-GERMANIUM [J].

GERMAIN, P ;

ZELLAMA, K ;

SQUELARD, S ;

BOURGOIN, JC ;

GHEORGHIU, A .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (11) :6986-6994

[3]

LAUDE LD, 1974, AIP C P, V20, P65

[4] REORDERING DIFFUSION PROCESSES IN AMORPHOUS THIN FILMS [J].

LONGINI, RL ;

PANSINO, SR .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (06) :2653-&

[5] CRYSTALLIZATION DURING ISO-CHRONAL ANNEALING OF VACUUM-DEPOSITED AMORPHOUS FILMS OF ANTIMONY [J].

MAKI, K .

JOURNAL OF CRYSTAL GROWTH, 1983, 65 (1-3) :77-83

[6]

SWALIN RA, 1973, ATOMIC DIFFUSION SEM

[7] ELECTRON STATES AND DISORDER IN AMORPHOUS GE FILMS STUDIED BY SECONDARY-ELECTRON EMISSION-SPECTROSCOPY [J].

WILLIS, RF ;

FITTON, B ;

LAUDE, LD .

PHYSICAL REVIEW LETTERS, 1972, 29 (04) :220-&

[8] CRYSTALLIZATION IN AMORPHOUS-SILICON [J].

ZELLAMA, K ;

GERMAIN, P ;

SQUELARD, S ;

BOURGOIN, JC ;

THOMAS, PA .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (11) :6995-7000

[9]

[No title captured]

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