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A 3-DIMENSIONAL MODEL FOR THE TRANSPORT-PROPERTIES OF POLYCRYSTALLINE SILICON
被引:7
作者
:
KWOK, HL
论文数:
0
引用数:
0
h-index:
0
KWOK, HL
HO, KH
论文数:
0
引用数:
0
h-index:
0
HO, KH
机构
:
来源
:
JOURNAL OF PHYSICS D-APPLIED PHYSICS
|
1982年
/ 15卷
/ 11期
关键词
:
D O I
:
10.1088/0022-3727/15/11/019
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:2271 / 2281
页数:11
相关论文
共 9 条
[1]
CHEMICAL VAPOR DEPOSITED POLYCRYSTALLINE SILICON.
Cowher, M.E.
论文数:
0
引用数:
0
h-index:
0
Cowher, M.E.
Sedgwick, T.O.
论文数:
0
引用数:
0
h-index:
0
Sedgwick, T.O.
[J].
1600,
(119):
[2]
THERMOELECTRIC AND PHOTOTHERMOELECTRIC EFFECTS IN SEMICONDUCTORS - CDS SINGLE-CRYSTALS
KWOK, HB
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
KWOK, HB
BUBE, RH
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
BUBE, RH
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(01)
: 138
-
144
[3]
CARRIER DENSITY AND MOBILITY IN CDXZN1-XS CHEMICALLY SPRAYED FILMS
KWOK, HL
论文数:
0
引用数:
0
h-index:
0
KWOK, HL
CHAU, YC
论文数:
0
引用数:
0
h-index:
0
CHAU, YC
[J].
THIN SOLID FILMS,
1980,
66
(03)
: 303
-
309
[4]
EFFECTS OF INHOMOGENEITY ON THERMOELECTRIC AND PHOTOTHERMOELECTRIC ANALYSES
KWOK, HL
论文数:
0
引用数:
0
h-index:
0
KWOK, HL
[J].
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
1980,
13
(03)
: 441
-
440
[5]
A STRUCTURAL APPROACH TO THE ANALYSIS OF THE ELECTRONIC-PROPERTIES OF CHEMICALLY SPRAYED CDS FILMS AND CELLS
KWOK, HL
论文数:
0
引用数:
0
h-index:
0
KWOK, HL
[J].
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
1980,
13
(10)
: 1911
-
&
[6]
MODELING AND OPTIMIZATION OF MONOLITHIC POLYCRYSTALLINE SILICON RESISTORS
LU, NCC
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
LU, NCC
GERZBERG, L
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
GERZBERG, L
LU, CY
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
LU, CY
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
MEINDL, JD
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(07)
: 818
-
830
[7]
A MODEL FOR CONDUCTION IN POLYCRYSTALLINE SILICON - .1. THEORY
MANDURAH, MM
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
MANDURAH, MM
SARASWAT, KC
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
SARASWAT, KC
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
KAMINS, TI
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(10)
: 1163
-
1171
[8]
DOPANT SEGREGATION IN POLYCRYSTALLINE SILICON
MANDURAH, MM
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
MANDURAH, MM
SARASWAT, KC
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
SARASWAT, KC
HELMS, CR
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HELMS, CR
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
KAMINS, TI
[J].
JOURNAL OF APPLIED PHYSICS,
1980,
51
(11)
: 5755
-
5763
[9]
SETO JYW, 1975, J APPL PHYS, V46, P247
←
1
→
共 9 条
[1]
CHEMICAL VAPOR DEPOSITED POLYCRYSTALLINE SILICON.
Cowher, M.E.
论文数:
0
引用数:
0
h-index:
0
Cowher, M.E.
Sedgwick, T.O.
论文数:
0
引用数:
0
h-index:
0
Sedgwick, T.O.
[J].
1600,
(119):
[2]
THERMOELECTRIC AND PHOTOTHERMOELECTRIC EFFECTS IN SEMICONDUCTORS - CDS SINGLE-CRYSTALS
KWOK, HB
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
KWOK, HB
BUBE, RH
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
BUBE, RH
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(01)
: 138
-
144
[3]
CARRIER DENSITY AND MOBILITY IN CDXZN1-XS CHEMICALLY SPRAYED FILMS
KWOK, HL
论文数:
0
引用数:
0
h-index:
0
KWOK, HL
CHAU, YC
论文数:
0
引用数:
0
h-index:
0
CHAU, YC
[J].
THIN SOLID FILMS,
1980,
66
(03)
: 303
-
309
[4]
EFFECTS OF INHOMOGENEITY ON THERMOELECTRIC AND PHOTOTHERMOELECTRIC ANALYSES
KWOK, HL
论文数:
0
引用数:
0
h-index:
0
KWOK, HL
[J].
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
1980,
13
(03)
: 441
-
440
[5]
A STRUCTURAL APPROACH TO THE ANALYSIS OF THE ELECTRONIC-PROPERTIES OF CHEMICALLY SPRAYED CDS FILMS AND CELLS
KWOK, HL
论文数:
0
引用数:
0
h-index:
0
KWOK, HL
[J].
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
1980,
13
(10)
: 1911
-
&
[6]
MODELING AND OPTIMIZATION OF MONOLITHIC POLYCRYSTALLINE SILICON RESISTORS
LU, NCC
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
LU, NCC
GERZBERG, L
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
GERZBERG, L
LU, CY
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
LU, CY
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
MEINDL, JD
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(07)
: 818
-
830
[7]
A MODEL FOR CONDUCTION IN POLYCRYSTALLINE SILICON - .1. THEORY
MANDURAH, MM
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
MANDURAH, MM
SARASWAT, KC
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
SARASWAT, KC
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
KAMINS, TI
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(10)
: 1163
-
1171
[8]
DOPANT SEGREGATION IN POLYCRYSTALLINE SILICON
MANDURAH, MM
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
MANDURAH, MM
SARASWAT, KC
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
SARASWAT, KC
HELMS, CR
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HELMS, CR
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,PALO ALTO,CA 94304
HEWLETT PACKARD CO,PALO ALTO,CA 94304
KAMINS, TI
[J].
JOURNAL OF APPLIED PHYSICS,
1980,
51
(11)
: 5755
-
5763
[9]
SETO JYW, 1975, J APPL PHYS, V46, P247
←
1
→