PHOTOEMISSION AND INVERSE PHOTOEMISSION OF TRANSITION-METAL SILICIDES

被引：88

作者：

SPEIER, W

VONLEUKEN, E

FUGGLE, JC

SARMA, DD

KUMAR, L

DAUTH, B

BUSCHOW, KHJ

机构：

[1] PHILIPS RES LABS, NAT KUNDIG LAB, 5600 JA EINDHOVEN, NETHERLANDS

[2] CATHOLIC UNIV NIJMEGEN, MAT RES INST, 6525 ED NIJMEGEN, NETHERLANDS

来源：

PHYSICAL REVIEW B | 1989年 / 39卷 / 09期

关键词：

D O I：

10.1103/PhysRevB.39.6008

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6008 / 6016

页数：9

共 35 条

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