THICKNESS DEPENDENT PROPERTIES OF SPUTTERED A-SI-H FROM RAMAN AND CONDUCTIVITY MEASUREMENT

被引:9
作者
RANCHOUX, B
JOUSSE, D
BRUYERE, JC
DENEUVILLE, A
机构
关键词
D O I
10.1016/0022-3093(83)90552-5
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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收藏
页码:185 / 188
页数:4
相关论文
共 11 条
[1]  
Anderson D. A., 1980, Journal of the Physical Society of Japan, V49, P1197
[2]  
BRUYERE JC, 1980, J PHYS LETT-PARIS, V41, pL27, DOI 10.1051/jphyslet:0198000410202700
[3]   X-RAYS AND RAMAN SENSITIVITY DIFFERENCES IN HETEROGENEOUS A-SI-H FROM PURE LPCVD [J].
BUSTARRET, E ;
DENEUVILLE, A ;
ROUXBUISSON, H ;
BRUNEL, L .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) :205-208
[4]  
BUSTARRET E, 1982, 16TH P INT C PHYS SE
[5]  
Currie J., UNPUB
[6]   THICKNESS DEPENDENCE OF HYDROGEN IN A-SI-H FILMS DEPOSITED ON C-SI [J].
CURRIE, JF ;
DEPELSENAIRE, P ;
GALARNEAU, S ;
LECUYER, J ;
GROLEAU, R ;
BRUYERE, JC ;
DENEUVILLE, A .
JOURNAL DE PHYSIQUE LETTRES, 1981, 42 (15) :L373-L376
[7]  
DENEUVILLE A, 1981, 9TH P INT C AM LIQ S, P733
[8]   PLASMA-HYDROGENATION EFFECTS AND THE THICKNESS DEPENDENCE OF ELECTRICAL-PROPERTIES AND ELECTRON-SPIN-RESONANCE IN UNDOPED CVD A-SI [J].
HASEGAWA, S ;
ANDO, D ;
KURATA, Y ;
SHIMIZU, T .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1983, 47 (02) :139-149
[9]   THICKNESS DEPENDENCE OF ELECTRICAL AND OPTICAL-PROPERTIES AND ELECTRON-SPIN-RESONANCE IN UNDOPED A-SI-H [J].
HASEGAWA, S ;
IMAI, Y .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1982, 46 (03) :239-251
[10]  
RANCHOUX B, UNPUB