MULTIPLE STEADY-STATES IN A RADIO-FREQUENCY CHLORINE GLOW-DISCHARGE

被引:19
作者
AYDIL, ES [1 ]
ECONOMOU, DJ [1 ]
机构
[1] UNIV HOUSTON,DEPT CHEM ENGN,HOUSTON,TX 77204
关键词
D O I
10.1063/1.347746
中图分类号
O59 [应用物理学];
学科分类号
摘要
Multiple steady states have been observed in a 13.56 MHz chlorine glow discharge in a parallel plate radial flow reactor. Measurements of the flux and energy distribution of positive ions bombarding the electrode are reported along with radial profiles of atomic chlorine (Cl) concentration and etch rate of polysilicon for different states of the plasma. At the same operating conditions the plasma may exist in one of two states. In one state the plasma appeared radially uniform, resulting in relatively uniform radial Cl concentration profiles and etch rate. In the other state the plasma appeared radially nonuniform with a higher intensity central region ("plasmoid"). The etch rate and Cl concentration profiled were nonuniform in the presence of the plasmoid. The plasmoid generally appeared under conditions of high power and pressure and could be eliminated by adding noble gases and/or decreasing the electrode spacing. The multiple states may be a result of the strongly electronegative nature of the chlorine discharge.
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页码:109 / 114
页数:6
相关论文
共 24 条
[1]  
BUSTA HH, 1979, SOLID STATE TECHNOL, V22, P61
[2]   THE CONTRACTED POSITIVE-COLUMN IN ELECTRONEGATIVE GASES [J].
DANIELS, PG ;
FRANKLIN, RN ;
SNELL, J .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1990, 23 (07) :823-831
[3]  
DETTMER JW, 1978, THESIS AIR FORCE I T
[4]   EFFECTS OF FREQUENCY ON OPTICAL-EMISSION, ELECTRICAL, ION, AND ETCHING CHARACTERISTICS OF A RADIO-FREQUENCY CHLORINE PLASMA [J].
DONNELLY, VM ;
FLAMM, DL ;
BRUCE, RH .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (06) :2135-2144
[5]   UNIFORMITY OF ETCHING IN PARALLEL PLATE PLASMA REACTORS [J].
ECONOMOU, DJ ;
PARK, SK ;
WILLIAMS, GD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (01) :188-198
[6]  
EINSPRUCH NG, 1984, VLSI ELECTRONICS MIC, V8
[7]   ETCHING AND FILM FORMATION IN CF3BR PLASMAS - SOME QUALITATIVE OBSERVATIONS AND THEIR GENERAL IMPLICATIONS [J].
FLAMM, DL ;
COWAN, PL ;
GOLOVCHENKO, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06) :1341-1347
[8]   COMPARISON OF EXPERIMENTAL MEASUREMENTS AND MODEL PREDICTIONS FOR RADIO-FREQUENCY AR DISCHARGES AND SF6 DISCHARGES [J].
GOGOLIDES, E ;
NICOLAI, JP ;
SAWIN, HH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :1001-1006
[9]   NEGATIVE-ION KINETICS IN RF GLOW-DISCHARGES [J].
GOTTSCHO, RA ;
GAEBE, CE .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) :92-102
[10]   OPTICAL-EMISSION ACTINOMETRY AND SPECTRAL-LINE SHAPES IN RF GLOW-DISCHARGES [J].
GOTTSCHO, RA ;
DONNELLY, VM .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) :245-250