UNIFORMITY OF ETCHING IN PARALLEL PLATE PLASMA REACTORS

被引：43

作者：

ECONOMOU, DJ

PARK, SK

WILLIAMS, GD

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 01期

关键词：

D O I：

10.1149/1.2096584

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：188 / 198

页数：11

共 37 条

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