TRANSIENT-BEHAVIOR DURING FILM REMOVAL IN DIFFUSION-CONTROLLED PLASMA-ETCHING

被引：17

作者：

ALKIRE, RC

ECONOMOU, DJ

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 03期

关键词：

D O I：

10.1149/1.2113922

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：648 / 656

页数：9

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