PHASE FORMATION AND IDENTIFICATION OF AN EPITAXIAL FE-NI ALLOY SILICIDE

被引：6

作者：

CHANG, YS ^{[1
]}

HSIEH, IJ ^{[1
]}

CHEN, H ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT MAT SCI & ENGN,URBANA,IL 61801

来源：

关键词：

D O I：

10.1063/1.342561

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：154 / 157

页数：4

共 18 条

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[2] GEXSI1-X/SI STRAINED-LAYER SUPERLATTICE GROWN BY MOLECULAR-BEAM EPITAXY
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[3] CHANG Y, UNPUB
[4] THE STRUCTURE IDENTIFICATION OF EPITAXIAL RU2SI3 ON (111) SI
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[6] CHANG YS, 1986, P INT ELECTRONIC DEV, P491
[7] KINETICS OF PD2SI LAYER GROWTH MEASURED BY AN X-RAY-DIFFRACTION TECHNIQUE
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[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (10) : 3467 - 3474
[8] DURNEY LJ, 1984, ELECTROPLATING ENG H, P449
[9] GARMRILOV GG, 1979, ELECTROLESS NICKEL P
[10] KUBAT M, 1984, POWER SEMICONDUCTORS, P274